Suzhou, China - The 2025 Advanced Photolithography Technology Seminar, organized by Semiconductor Online, was successfully held in Suzhou, China. The event aimed to foster academic exchange and industrial collaboration in the field of advanced lithography technology, exploring the latest technological advancements, process optimization, and future development trends.
At the seminar, Yu Jieming, Marketing Manager, China of SMC, delivered a keynote presentation titled "Advancement of Photolithography Equipment in SMC Power Semiconductor Photoing Processes." The report highlighted the application and progress of fully automated coating, developing, and other photolithography equipment in the company’s production processes.
The presentation detailed the lithography-related equipment and chemicals utilized by SMC, with a focus on the selection criteria, testing metrics, and key performance data for photoresists, aligners, and other critical tools.
As semiconductor manufacturing processes continue to advance, photolithography technology is evolving rapidly. Emerging techniques such as extreme ultraviolet lithography (EUV) and electron beam lithography (EBL) are gaining traction. Furthermore, with progress in nanotechnology and materials science, the performance of lithography equipment is expected to reach new heights, driving the semiconductor industry into a more advanced technological era.
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